This tender is from the country of Germany in Europe region. The tender was published by Ludwig Maximilians University in Munich on 01 Sep 2025 for Procurement of a hybrid plasma etching and coating system The procurement procedure described here concerns the procurement of a system for atomic system separation Atomic Layer Deposition ALD and atomic sets Atomic Layer Etching Ale for plasma -supported processes for separation at low temperatures In addition the system must have a bias-capable electrode in order to carry out classic parallel slabs-rie processes The vacuum system must be able to regulate the process pressure stable using a wide pressure area since ALD processes usually require higher pressures than RIE processes In addition all essential functions of a Rie and a PE Ald must be fully fulfilled as are listed in the minimum requirements of the tender Rie processes with capacitively coupled plasma and chemical departure processes as IC PECVD must also be feasible. The last date to submit your bid for this tender was 29 Sep 2025. This tender is for the companies specializing in Coating materials and similar sectors.
*The deadline for this tender has passed.
Tender Organisation:
Ludwig Maximilians University in Munich
Tender Sector:
Tender Service:
Worldwide
Tender Region:
Tender Country:
Tender CPV:
44113330 : Coating materials
Tender Document Type:
Tender Notice
Tender Description:
Procurement of a hybrid plasma etching and coating system The procurement procedure described here concerns the procurement of a system for atomic system separation Atomic Layer Deposition ALD and atomic sets Atomic Layer Etching Ale for plasma -supported processes for separation at low temperatures In addition the system must have a bias-capable electrode in order to carry out classic parallel slabs-rie processes The vacuum system must be able to regulate the process pressure stable using a wide pressure area since ALD processes usually require higher pressures than RIE processes In addition all essential functions of a Rie and a PE Ald must be fully fulfilled as are listed in the minimum requirements of the tender Rie processes with capacitively coupled plasma and chemical departure processes as IC PECVD must also be feasible
Tender Bidding Type:
Tender Notice No:
Tender Document:
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