This tender is from the country of Germany in Europe region. The tender was published by Wet and ggmb on 08 Jul 2025 for Delivery installation and commissioning of two new non-used vacuum process chambers for the thermal treatment of wafers and samples The intended commission includes the delivery installation and commissioning of two new non-used vacuum process chambers for thermal treatment of wafers and rehearsals under different gas atmospheres and in vacuum with very steep heating ramps up to 1200 C and cooling ramps VRTP The two chambers can be offered as a system with two process chambers or as two individual systems each with one chamber which can carry out the very steep heating and cooling ramps The machines are used for the thermal processing of thin layers and the processing of micro nanoelectronic components You have to be compatible with CMOS standards A chamber should be able to process Wafer with a diameter of up to 200 mm The second chamber should be able to process Wafer and rehearsals up to a size of at least 150 mm Processing must be able to take place in such a way that the two chambers meet different contamination classes The system s should be in the clean room of ISO class 6 DIN EN ISO 14644-1 of the client on the first floor of its building on N thnitzer Stra e 64a in 01187 Dresden and must meet the requirements for this clean room. The last date to submit your bid for this tender was 12 Aug 2025. This tender is for the companies specializing in Water chambers and similar sectors.
*The deadline for this tender has passed.
Tender Organisation:
Wet and ggmb
Tender Sector:
Tender Service:
Worldwide
Tender Region:
Tender Country:
Tender CPV:
44613210 : Water chambers
Tender Document Type:
Tender Notice
Tender Description:
Delivery installation and commissioning of two new non-used vacuum process chambers for the thermal treatment of wafers and samples The intended commission includes the delivery installation and commissioning of two new non-used vacuum process chambers for thermal treatment of wafers and rehearsals under different gas atmospheres and in vacuum with very steep heating ramps up to 1200 C and cooling ramps VRTP The two chambers can be offered as a system with two process chambers or as two individual systems each with one chamber which can carry out the very steep heating and cooling ramps The machines are used for the thermal processing of thin layers and the processing of micro nanoelectronic components You have to be compatible with CMOS standards A chamber should be able to process Wafer with a diameter of up to 200 mm The second chamber should be able to process Wafer and rehearsals up to a size of at least 150 mm Processing must be able to take place in such a way that the two chambers meet different contamination classes The system s should be in the clean room of ISO class 6 DIN EN ISO 14644-1 of the client on the first floor of its building on N thnitzer Stra e 64a in 01187 Dresden and must meet the requirements for this clean room
Tender Bidding Type:
Tender Notice No:
Tender Document:
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